Matrix Metrologies Introduces
New MXRF Tool platform for Microelectronic, Semiconductor, Data-storage and sophisticated metal film and composition analysis
Nano XRF tool Delivers Microanalysis with Sensitivity
HOLBROOK, NY, - June, 2005
– Matrix Metrologies, Inc., offering a complete line of Micro X-Ray Fluorescence (MXRF) systems, introduces state-of-the-art analysis
in the NanoXRF MXRF analyzer. For a multitude of film thickness and composition
analysis applications, NanoXRF features flexibility and performance. Configurable
with mechanical beam collimation or high flux beam optics, highly resolving Si-PIN detector or high-resolution ultimate throughput
Si Drift Detection (SDD), NanoXRF can meet the most stringent microanalysis requirements for spatial resolution (spot size
down to ~40 microns), precision (105 counts per second processing) and sensitivity (ppm / low mass level detection). Most NanoXRF applications can be run in air, but when light elements or low energy
lines need to be analyzed the NanoXRF offers analysis in vacuum as well.
Matrix Metrologies headquartered in Holbrook, New York offers
over twenty five years experience in metrology analysis, XRF instrumentation recertification and repair and supplies a complete
line of NIST traceable calibration standards and recertification services.
Additional information on Matrix
can be found at http://www.matrixmetrologies.com.
